| 摘要 |
An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage and is configured to hold the original, an electrode which is provided outside the electrostatic chuck on the stage via an insulator, and an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode. The particle adherence to the original can be effectively avoided.
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