| 摘要 |
A method for the structuring of multicrystalline silicon substrate surfaces and emitter diffusion into said surfaces comprises the following steps: providing a texturing solution which comprises at least a portion of phosphoric acid, providing a semiconductor substrate with a surface to be structured, coating the surface to be structured with the texturing solution, heating the texturing solution to a heating temperature TT, and heating the texturing solution to a diffusion temperature TD, wherein TD>TT.
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