| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can form a resist pattern of excellent shape, and a resist pattern forming method. <P>SOLUTION: The resist composition includes a base component A which exhibits changed solubility in an alkali developing solution under the action of acid, an acid-generator component B which generates acid upon exposure, and a nitrogen-containing organic compound D1 having a molecular weight of 200 or more, which is represented by a formula d1, wherein each of R<SP>1</SP>to R<SP>3</SP>independently represents a hydrocarbon group which may have a substituent, at least one of R<SP>1</SP>to R<SP>3</SP>is a polar group-containing hydrocarbon group, at least one of R<SP>1</SP>to R<SP>3</SP>is a hydrophobic group, and two of R<SP>1</SP>to R<SP>3</SP>may be bonded to each other to form a ring with a nitrogen atom in the formula. <P>COPYRIGHT: (C)2009,JPO&INPIT |
