发明名称 SURFACE-MODIFIED MESOPOROUS SILICA, SLURRY COMPOSITION FOR ADDITION TO RESIN USING THE SAME, FILLER FOR RESIN, RESIN COMPOSITION, ELECTRONIC COMPONENT FOR HIGH FREQUENCY AND SUBSTRATE FOR HIGH FREQUENCY CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide surface-modified mesoporous silica which has a silanol group on the surface of mesoporous silica being satisfactorily modified, and accordingly has a low dielectric constant, a slurry composition for addition to a resin using it, a filler for a resin and a resin composition. SOLUTION: The silanol group existing on the surface of the mesoporous silica having a pore diameter of 1.5 nm or more is chemically modified with a hydrophobic functional group. As the average pore diameter of the mesoporous silica is 1.5 nm or more and is large, a reagent for chemical modification enters into the pore easily, a modification rate of the chemical modification with a hydrophobic functional group becomes high and it contributes to the effect lowering dielectric constant at the inside of the pore. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009107863(A) 申请公布日期 2009.05.21
申请号 JP20070279725 申请日期 2007.10.27
申请人 TOYOTA TSUSHO CORP;ADMATECHS CO LTD;TAIYO KAGAKU CO LTD 发明人 KOBA SHOSUKE;SHIMIZU KAZUMOTO;YASUKI HIDEKI;OKAWACHI YOSHINORI;YANAGIHARA TAKESHI;KITAHATA KOICHI;KASAMA YUKI;YANAGI MASAAKI;NANBU HIRONOBU;YAMAZAKI YOSHIKI
分类号 C01B37/02;C08K3/36;C08L101/00 主分类号 C01B37/02
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