发明名称 CHILLER OF ETCH EQUIPMENT FOR SEMICONDUCTOR PROCESSING
摘要 A chiller for etching equipment for processing a semiconductor includes: a chuck for controlling a temperature of a semiconductor wafer, a coolant pipeline connected to the chuck, a coolant tank connected to the coolant pipeline, an evaporator in the coolant tank, a refrigerant in the evaporator, a compressor for compressing refrigerant flowing from the evaporator, a condenser for condensing the compressed refrigerant from the compressor, and an electronically controlled expansion valve connected to the condenser to receive compressed refrigerant, and connected to the evaporator for feeding the expanded refrigerant into evaporator.
申请公布号 US2009126378(A1) 申请公布日期 2009.05.21
申请号 US20080271889 申请日期 2008.11.15
申请人 OH HYUN-MYUNG 发明人 OH HYUN-MYUNG
分类号 F25B1/00;F25B49/00 主分类号 F25B1/00
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