发明名称 |
GROUP III NITRIDE SEMICONDUCTOR CRYSTAL SUBSTRATE AND SEMICONDUCTOR DEVICE |
摘要 |
A group III nitride semiconductor crystal substrate has a diameter of at least 25 mm and not more than 160 mm. The resistivity of the group III nitride semiconductor crystal substrate is at least 1x10-4 Omega.m and not more than 0.1 Omega.cm. The resistivity distribution in the diameter direction of the group III nitride semiconductor crystal is at least -30% and not more than 30%. The resistivity distribution in the thickness direction of the group III nitride semiconductor crystal is at least -16% and not more than 16%. |
申请公布号 |
US2009127662(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20080273101 |
申请日期 |
2008.11.18 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
OKAHISA TAKUJI;KAWASE TOMOHIRO;UEMURA TOMOKI;NISHIOKA MUNEYUKI;ARAKAWA SATOSHI |
分类号 |
H01L29/20;H01L33/32 |
主分类号 |
H01L29/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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