发明名称 GROUP III NITRIDE SEMICONDUCTOR CRYSTAL SUBSTRATE AND SEMICONDUCTOR DEVICE
摘要 A group III nitride semiconductor crystal substrate has a diameter of at least 25 mm and not more than 160 mm. The resistivity of the group III nitride semiconductor crystal substrate is at least 1x10-4 Omega.m and not more than 0.1 Omega.cm. The resistivity distribution in the diameter direction of the group III nitride semiconductor crystal is at least -30% and not more than 30%. The resistivity distribution in the thickness direction of the group III nitride semiconductor crystal is at least -16% and not more than 16%.
申请公布号 US2009127662(A1) 申请公布日期 2009.05.21
申请号 US20080273101 申请日期 2008.11.18
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 OKAHISA TAKUJI;KAWASE TOMOHIRO;UEMURA TOMOKI;NISHIOKA MUNEYUKI;ARAKAWA SATOSHI
分类号 H01L29/20;H01L33/32 主分类号 H01L29/20
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