发明名称 PRESSURE SENSOR, AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a pressure sensor and a manufacturing method thereof, capable of reducing deterioration of withstand pressure due to stress concentration. SOLUTION: This manufacturing method of the pressure sensor equipped with an insulating layer 2 provided between a first semiconductor layer 1 and a second semiconductor layer 3 forming a diaphragm 4 includes a process to etch the first semiconductor layer 1 in a section forming a pressure sensitive region with the insulating layer 2 used as an etching stopper, a process to etch the insulating layer 2 in the section forming the pressure sensitive region, a process to form a protective film 7 on the side wall of the first semiconductor layer 1, and a process to form the diaphragm 4 by etching the second semiconductor layer 3 in the section forming the pressure sensitive region after forming the protective layer 7. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009111164(A) 申请公布日期 2009.05.21
申请号 JP20070281989 申请日期 2007.10.30
申请人 YAMATAKE CORP 发明人 TOKUDA TOMOHISA;TOJO HIROSHI
分类号 H01L29/84;G01L9/00 主分类号 H01L29/84
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