发明名称 LITHOGRAPHIC APPARATUS AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate carrier which copes with various shapes and sizes of a substrate. <P>SOLUTION: A substrate carrier WC arranged to hold a substrate in a predetermined position is disclosed. The substrate carrier has a transparent region 2 that extends through the substrate carrier from the side of the substrate carrier on which the substrate is held to the opposite side of the substrate carrier, the transparent region is formed of glass, and substantially transparent to a signal used to determine a position of an edge of the substrate on the substrate carrier. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009111348(A) 申请公布日期 2009.05.21
申请号 JP20080227687 申请日期 2008.09.05
申请人 ASML NETHERLANDS BV 发明人 LEONARDUS VAN DIJK PAULUS WILHELMUS;VAN BUEL HENRICUS WILHELMUS MARIA;KEIJSERS GERARDUS JOHANNES JOSEPH;ONVLEE JOHANNES;VAN DEN BROEK JOHANNES ARIE
分类号 H01L21/683;G03F7/20;H01L21/027 主分类号 H01L21/683
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