| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position detector for certainly detecting a pattern to be detected even if a pseudo pattern having high degree of matching with a template exists near a mark to be detected. <P>SOLUTION: The position detector M, which detects the position of a mark WM formed on a substrate W, includes a creating unit 9, a search unit 13, and a correction unit 14. The creating unit 9 creates a template used for identifying the mark to be detected WM based on an image including the mark WM. The search unit 13 searches the image including the mark WM by using the template created by the creating unit 9, and determines whether there is a pseudo pattern, other than the pattern of the mark WM, whose degree of matching with the template is higher than a reference value. The correction unit 14 corrects the template created by the creating unit 9 based on the information of the pseudo pattern when it is determined that there is the pseudo pattern, and creates a corrected template whose degree of matching with the pseudo pattern is lower than the reference value. <P>COPYRIGHT: (C)2009,JPO&INPIT |
