| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase the stable operating range of active damping. <P>SOLUTION: A lithographic apparatus comprises an illumination system, configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further comprises a substrate table constructed to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system comprises a combination of a sensor to measure the position quantity of the projection system, and an actuator to exert a force on the projection system with the dependence on a signal provided by the sensor. The active damping system is connected to a damping mass, with the damping mass being connected to the projection system. <P>COPYRIGHT: (C)2009,JPO&INPIT |
