发明名称 EVALUATION METHOD AND EVALUATION DEVICE, METHOD AND SYSTEM FOR TREATING SUBSTRATE, SUBSTRATE TREATMENT EQUIPMENT, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an evaluation method capable of excellently evaluating whether a substrate is fitted to a liquid-immersion exposure. <P>SOLUTION: The method for evaluating the substrate exposed through a first liquid contains the formation of a first film on the first surface of the substrate and the supply of a second liquid from a liquid supply port while relatively moving the substrate forming the first film and the liquid supply port at a place different from an exposing place. The method for exposing the substrate further contains the observation of the substrate after the second liquid is supplied and the evaluation of the first film on the basis of the result of the observation. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009111325(A) 申请公布日期 2009.05.21
申请号 JP20080029454 申请日期 2008.02.08
申请人 NIKON CORP 发明人 MIYAZAWA TAMI;HAYASHI TSUNEHITO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址