| 摘要 |
There is provided a developer composition which can from a good thick-film resist pattern and is less likely to cause frothing. This composition is a developer composition used to form a thick-film resist pattern on a substrate, and contains an organic quaternary ammonium base as a main component, an anionic surfactant represented by the following general formula (I), and a defoaming agent selected from the group consisting of a silicone-based defoaming agent, an alcohol-based defoaming agent and a nonionic surfactant-based defoaming agent: R1 in the formula (I) represents an alkyl or alkoxy group having 5 to 18 carbon atoms; "a" represents 1 or 2; R2 and R3 independently represent an ammonium sulfonate group, a substituted ammonium sulfonate group, or a group represented by the following general formula (II); "b" represents an integer of 0 or 1 to 3; and "c" represents an integer of 1 to 3; and <?in-line-formulae description="In-line Formulae" end="lead"?>-SO3M (II)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein M in the formula (II) represents a metal atom.
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