| 摘要 |
According to an embodiment, the method of manufacturing a thin film transistor array panel includes forming a gate wire, a data wire, and a thin film transistor on a substrate and depositing an organic material layer on the gate wire, the data wire, and the thin film transistor. The method further includes forming an optical pattern on the upper surface of the organic material layer, depositing a reflecting electrode layer on the organic material layer, etching the reflecting electrode layer, etching the organic material layer after etching the reflecting electrode layer, and forming a pixel electrode on the reflecting electrode layer. Accordingly, the optical pattern on the upper surface of organic material may be transcribed to the reflecting electrode layer without damage and with clarity. |
