发明名称 TRANSPARENT CONDUCTIVE FILM AND SPUTTERING TARGET FOR FORMING TRANSPARENT CONDUCTIVE FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a transparent conductive film used for a liquid crystal display, electroluminescent display device, anti-static conductive film coating, gas sensor, solar battery or the like, and a sputtering target for forming the transparent conductive film. <P>SOLUTION: The transparent conductive film is made of zinc oxide with Ce:0.2 to 5 atom% doped, and further, with Al doped at Al:0.005 to 0.5 atom% so that an Al dope volume is smaller than a Ce dope volume, and carbon contained in the transparent conductive film as inevitable impurities is limited to 40 ppm or less. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009110664(A) 申请公布日期 2009.05.21
申请号 JP20070278313 申请日期 2007.10.26
申请人 MITSUBISHI MATERIALS CORP 发明人 CHO SHUHIN;MISHIMA TERUSHI;MAYUZUMI YOSHIYUKI
分类号 H01B5/14;C04B35/453;C23C14/08;C23C14/34;H01B1/08 主分类号 H01B5/14
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