| 摘要 |
PROBLEM TO BE SOLVED: To provide a formation method of a coating film which enables the formation of a coating film with uniform film thickness and is free from linear unevenness etc., when forming the circular coating film on a base. SOLUTION: This formation method of a coating film employs a coating device constituted of a rotatable table for horizontally retaining the base and a horizontally movable nozzle which is ascendable/descendable to the table and equipped with a discharge orifice at the apex. In addition, the method forms the circular coating film by rotating the table and at the same time, supplying a liquid coating solution to the surface of the base from the discharge orifice, while moving the nozzle in one direction between the rotational center of the table and a specified outer position in such a state that the nozzle is retained at a specified height to the table. Given the viscosity of the liquid coating solution as "η", the film thickness after coating as "h" and the wavelength of the surface swell of the coating solution after coating asλ, the coating film has to be formed on condition that the half-life t<SB>1/2</SB>represented by formula (1) be not more than 8. COPYRIGHT: (C)2009,JPO&INPIT |
