发明名称 |
Methods for Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices |
摘要 |
A batch of wafers is temporarily stalled during a Double Pattern Technology (DPT) process before a temporary representation of a second of to-be-overlaid patterns is permanently combined with a first of the patterns. Sampled ones of the stalled wafers are inspected to determine if sufficiently close alignment is present between the two patterns. If excessive misalignment is detected (e.g., by SEM microscopy), the second but still temporary pattern representation is erased from all wafers of the batch and the batch is routed for rework and corrected reestablishment of the temporary representation of the second of to-be-overlaid patterns.
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申请公布号 |
US2009130570(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20070943931 |
申请日期 |
2007.11.21 |
申请人 |
ZHANG XINYU;ZHANG FENG-HONG |
发明人 |
ZHANG XINYU;ZHANG FENG-HONG |
分类号 |
G03F1/00;G03C1/72 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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