NAPHTHOQUINONE DIAZIDE SULFONIC ACID ESTER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION USING IT, AND SEMICONDUCTOR UNIT

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition capable of obtaining a pattern of high resolving power and high film remaining rate even in an increased film thickness, and high sensitivity.

SOLUTION: This positive photosensitive resin composition contains (A) 100 pts.wt. of an alkali soluble resin and (B) 1-50 pts.wt. of 1,2-naphthoquinone-2-diazide-5-sulfonic acid ester and/or 1,2-naphthoquinone-2-diazide-4-sulfonic acid ester of a phenol compound.

COPYRIGHT: (C)2009,JPO&INPIT