| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection method and device for a semiconductor device which can discriminate a defect position in the semiconductor device, even if it is the case where voltage is applied to a non-electrode plane which does not form an electrode of the semiconductor device, by using infrared ray irradiated to non-electrode plane or infrared ray radiated from non-electrode plane. SOLUTION: In the inspection method of the semiconductor device which discriminates the defect position of the semiconductor device 10 using infrared ray, the inspection method includes a process which contacts a transparent electrode 21b with non-electrode plane 10a which does not form the electrode of the semiconductor device 10, a process consisting of applying voltage to non-electrode plane 10a of the semiconductor device 10 through the transparent electrode 21b, and irradiating of infrared ray spot light 31 into non-electrode plane 10a of the semiconductor device 10 through the transparent electrode 21b, and a process discriminating the defect position of the semiconductor device 10, by scanning non-electrode plane 10a of the semiconductor device 10 using infrared ray spot light 31, and measuring a current variationΔI of the semiconductor device 10. COPYRIGHT: (C)2009,JPO&INPIT
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