发明名称 |
METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH WRAP AROUND MAGNETIC TRAILING AND SIDE SHIELDS |
摘要 |
A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.
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申请公布号 |
US2009128964(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20070944125 |
申请日期 |
2007.11.21 |
申请人 |
GUTHRIE HUNG-CHIN;JIANG MING;SHI CHANGQING;ZHANG SUE SIYANG |
发明人 |
GUTHRIE HUNG-CHIN;JIANG MING;SHI CHANGQING;ZHANG SUE SIYANG |
分类号 |
G11B5/127 |
主分类号 |
G11B5/127 |
代理机构 |
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主权项 |
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地址 |
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