发明名称 METHOD FOR PRODUCING POLYHYDROXYAMIDE AND POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a polyhydroxyamide which is a base polymer of a positive type photosensitive resin composition and enabling the control of molecular weight, molecular weight distribution and dissolution rate to an alkaline developing liquid in high reproducibility. <P>SOLUTION: The polyhydroxyamide is produced by reacting a bisaminophenol compound with a dicarboxylic acid derivative compound expressed by formula (1) (in the formula, R is an organic group), wherein the solid concentration of the reaction solution is 30-50%, the reaction temperature is 50-90&deg;C, the reaction time is 3-12 hours, the reaction molar ratio of the bisaminophenol compound to the dicarboxylic acid derivative compound is 0.7-1.3, and the terminal is blocked. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009108209(A) 申请公布日期 2009.05.21
申请号 JP20070282567 申请日期 2007.10.31
申请人 SUMITOMO BAKELITE CO LTD 发明人 TAKEDA TOSHIRO;KUBOYAMA TOSHIHARU;FUJITA KAZUYOSHI
分类号 C08G69/28;G03F7/023 主分类号 C08G69/28
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