| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a Co-base sintered alloy sputtering target for forming a magnetic recording film of low relative magnetic permeability. SOLUTION: In the manufacturing method of the Co-base sintered alloy sputtering target for forming the magnetic recording film of low relative magnetic permeability, Co-Cr-Pt alloy powder containing high Cr, Co-Cr-Pt alloy powder containing low Cr with less Cr content than that of the Co-Cr-Pt alloy powder containing high Cr, Pt powder and non-magnetic oxide powder are mixed so as to get the composition containing 0.5-15 mol% non-magnetic oxide, 4-20 mol% Cr, and 5-25 mol% Pt and the balance Co and inevitable impurities, and the mixture is pressure-sintered. COPYRIGHT: (C)2009,JPO&INPIT
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