发明名称 SEMICONDUCTOR THIN FILM AND PROCESS FOR PRODUCING THE SAME
摘要 This invention provides a transparent oxide semiconductor, which comprises an oxide comprising indium oxide as a main component and cerium oxide as an additive and has such properties that light-derived malfunction does not occur, there is no variation in specific resistance of a thin film caused by heating and the like, and the mobility is high, and a process for producing the same. A semiconductor thin film characterized by comprising indium oxide and cerium oxide and being crystalline and having a specific resistance of 10+1 to 10+8 Omegacm is used. This semiconductor thin film has no significant change in specific resistance and has high mobility. Accordingly, an element having improved switching properties can be provided by constructing a switching element using this semiconductor thin film.
申请公布号 US2009127548(A1) 申请公布日期 2009.05.21
申请号 US20060090731 申请日期 2006.08.07
申请人 IDEMITSU KOSAN CO., LTD. 发明人 INOUE KAZUYOSHI;YANO KOKI;TANAKA NOBUO;TANAKA TOKIE
分类号 H01L29/66;H01L21/34 主分类号 H01L29/66
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