| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system and a film deposition method with which maintenance time can be reduced, and productivity of a thin film is improved. SOLUTION: A catalyst CVD chamber 13 is mounted with a retreat chamber 31 elongating along the facial direction of a substrate S lying at a film deposition position, a holder 33 stored in the retreat chamber 31 is elevated, and respective catalyst lines 35 are selectively arranged at a film deposition chamber 21 and the retreat chamber 31, respectively. Then, in the case a film deposition gas is fed to the film deposition chamber 21, the respective catalyst lines 35 are moved to the film deposition chamber 21, respectively, and, in the case a cleaning gas is fed to the film deposition chamber 21, the respective catalyst lines 35 are moved to the retreat chamber 31, respectively, and a gate valve GV2 is closed. COPYRIGHT: (C)2009,JPO&INPIT
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