发明名称 NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 Semiconductor devices, in particular nitride semiconductor devices for use in the manufacture of laser diodes, prevent peeling-off of the electrode, and at the same time reduces the complexity of processes and a reduction in yield. A nitride semiconductor device according to the invention includes a P-type nitride semiconductor layer with a ridge on its surface, an SiO2 film covering at least the side face of the ridge, an adherence layer formed on a surface of the SiO2 film and composed mainly of silicon, and a P-type electrode formed on the upper surface of the ridge and on a surface of the adherence layer.
申请公布号 US2009127661(A1) 申请公布日期 2009.05.21
申请号 US20080271946 申请日期 2008.11.17
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 SHIOZAWA KATSUOMI;KANAMOTO KYOZO;OISHI TOSHIYUKI;KUROKAWA HIROSHI;KAWASAKI KAZUSHIGE;ABE SHINJI;SAKUMA HITOSHI
分类号 H01L29/20;H01L21/31 主分类号 H01L29/20
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