| 发明名称 |
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR |
| 摘要 |
A compound represented by general formula (I); and a compound represented by general formula (b1-1). <?in-line-formulae description="In-line Formulae" end="lead"?>X-Q1-Y1-SO3-M+ [Chemical Formula 1]<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>(I)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>X-Q1-Y1-SO3-A+<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>(b1-1)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an -SO2- bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
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| 申请公布号 |
US2009130597(A1) |
申请公布日期 |
2009.05.21 |
| 申请号 |
US20080265607 |
申请日期 |
2008.11.05 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SESHIMO TAKEHIRO;UTSUMI YOSHIYUKI;KAWAUE AKIYA;HADA HIDEO;SHIMIZU HIROAKI;NAKAMURA TSUYOSHI |
| 分类号 |
G03F7/031;C07C309/04;C07D327/04;G03F7/20 |
主分类号 |
G03F7/031 |
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