| 发明名称 |
SILICON CARBIDE POLISHING METHOD UTILIZING WATER-SOLUBLE OXIDIZERS |
| 摘要 |
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, an abrasive, and an oxidizing agent. |
| 申请公布号 |
KR20090051263(A) |
申请公布日期 |
2009.05.21 |
| 申请号 |
KR20097006892 |
申请日期 |
2007.09.04 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
DESAI MUKESH;MOEGGENBORG KEVIN;CARTER PHILLIP |
| 分类号 |
C09K3/14;H01L21/304 |
主分类号 |
C09K3/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
