发明名称 |
IN-LINE SUBSTRATE TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide an in-line substrate treatment apparatus suitably used for manufacturing a magnetic recording disk such as a hard disk. SOLUTION: First and second revolving mechanisms for revolving substrate holders 51 and 52 respectively are disposed along first and second endless conveying paths 1 and 2 to which a plurality of vacuum chambers containing a treatment chamber is connected, wherein the substrate holders 51 and 52 hold a substrate and the treatment chamber treats the substrate in vacuum. A conveying system is established so as to remove the substrate from the first substrate holder 51, convey the substrate in vacuum along a third conveying path 3 without sending it into the atmosphere and transfer the substrate to the second substrate holder 52. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009108419(A) |
申请公布日期 |
2009.05.21 |
申请号 |
JP20080327286 |
申请日期 |
2008.12.24 |
申请人 |
CANON ANELVA CORP;NIHON MICRO COATING CO LTD |
发明人 |
WATANABE NAOKI;WATANABE NOBUYOSHI;TANI KAZUNORI;FURUKAWA SHINJI;SASAKI HIROMI;WATABE OSAMU |
分类号 |
C23C14/56;C23C16/44;G11B5/84;G11B5/851 |
主分类号 |
C23C14/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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