发明名称 IN-LINE SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an in-line substrate treatment apparatus suitably used for manufacturing a magnetic recording disk such as a hard disk. SOLUTION: First and second revolving mechanisms for revolving substrate holders 51 and 52 respectively are disposed along first and second endless conveying paths 1 and 2 to which a plurality of vacuum chambers containing a treatment chamber is connected, wherein the substrate holders 51 and 52 hold a substrate and the treatment chamber treats the substrate in vacuum. A conveying system is established so as to remove the substrate from the first substrate holder 51, convey the substrate in vacuum along a third conveying path 3 without sending it into the atmosphere and transfer the substrate to the second substrate holder 52. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009108419(A) 申请公布日期 2009.05.21
申请号 JP20080327286 申请日期 2008.12.24
申请人 CANON ANELVA CORP;NIHON MICRO COATING CO LTD 发明人 WATANABE NAOKI;WATANABE NOBUYOSHI;TANI KAZUNORI;FURUKAWA SHINJI;SASAKI HIROMI;WATABE OSAMU
分类号 C23C14/56;C23C16/44;G11B5/84;G11B5/851 主分类号 C23C14/56
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