发明名称 Method of manufacturing a capacitor and memory device including the same
摘要 In a capacitor of a semiconductor device, a method of manufacturing the same and a memory device including the capacitor, the capacitor includes a lower electrode, a dielectric film on the lower electrode, an upper electrode on the dielectric film, and a first reaction barrier film for preventing a reaction between the lower electrode and the dielectric film, the first reaction barrier film being interposed between the lower electrode and the dielectric film.
申请公布号 US2009126173(A1) 申请公布日期 2009.05.21
申请号 US20080314427 申请日期 2008.12.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE JUNG-HYUN;SEO BUM-SEOK
分类号 H01G9/00;H01G13/00;H01G4/10;H01G4/12;H01G4/33;H01L21/02;H01L21/316;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L27/115 主分类号 H01G9/00
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