发明名称 |
Method of manufacturing a capacitor and memory device including the same |
摘要 |
In a capacitor of a semiconductor device, a method of manufacturing the same and a memory device including the capacitor, the capacitor includes a lower electrode, a dielectric film on the lower electrode, an upper electrode on the dielectric film, and a first reaction barrier film for preventing a reaction between the lower electrode and the dielectric film, the first reaction barrier film being interposed between the lower electrode and the dielectric film.
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申请公布号 |
US2009126173(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20080314427 |
申请日期 |
2008.12.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE JUNG-HYUN;SEO BUM-SEOK |
分类号 |
H01G9/00;H01G13/00;H01G4/10;H01G4/12;H01G4/33;H01L21/02;H01L21/316;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L27/115 |
主分类号 |
H01G9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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