发明名称 System and method for supplying processing water
摘要 The present invention provides a system 1A for supplying processing water 3, which is used in the operation of processing a target object with a highly pressurized jet of processing water 3 containing an abrasive, including: a tank 2 for storing the processing water 3, having a lower portion substantially tapering downwards; a supply pipe 5 for supplying the processing water 3 to the tank 2; a delivery pipe 8 having an opening 9 located inside the tank 2; a pressure mechanism 7 located outside the tank 2, for pressurizing the processing water 3; and a suction port 10 provided in the side surface of the delivery pipe 8. The processing water 3 in the tank 2 is stratified into a deposition portion 4A, which is a portion where the abrasive is deposited, and a clear-water portion 4W, which is a portion other than the deposition portion 4A and formed by clear water substantially free from the abrasive. The opening 9 is located near an end of the delivery pipe 8 and at a position within the deposition portion 4A, while the suction port 10 is located at a position within the clear-water portion 4W.
申请公布号 US2009126543(A1) 申请公布日期 2009.05.21
申请号 US20080289845 申请日期 2008.11.05
申请人 TOWA CORPORATION 发明人 KITAGAWA YASUYUKI;YAMAJI SHUZO;HIBI TAKAAKI;TOMIZAWA KANA
分类号 B24C9/00;B01D33/00 主分类号 B24C9/00
代理机构 代理人
主权项
地址