发明名称 METHOD OF ETCHING DEPOSITION FILM
摘要 PROBLEM TO BE SOLVED: To provide a heating element CVD method in which the life of the heating element is prolonged, a fixing method of the heating element is improved, and productivity is improved in a heating element CVD system which decomposes and/or activates material gas introduced in a processing vessel (vacuum chamber) by the heating element and deposits a thin film on a substrate arranged in the processing vessel (vacuum chamber). SOLUTION: The heating element CVD system with a gas introduction mechanism 321 is used, in which a connection part 33 in which the heating element 3 is connected to a power supply mechanism and/or a support part 31 in which the heating element is supported by a support is covered with a cover without contacting the heating element by interposing a gap between the connection part 33 and the support part 31, and introduces the gas in the gap between the cover and the connection part 33, the support part 31, and purge gas is introduced at the end of the heating element 3 inserted into a heating element insertion port provided at the connection part 33. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009111397(A) 申请公布日期 2009.05.21
申请号 JP20080283250 申请日期 2008.11.04
申请人 CANON ANELVA CORP 发明人 ISHIBASHI KEIJI;TANAKA MASAHIKO;KARASAWA MINORU
分类号 H01L21/205;C23C16/44;H01L21/3065 主分类号 H01L21/205
代理机构 代理人
主权项
地址