Resist composition, method of forming resist pattern, novel compound, and acid generator

摘要

A compound represented by general formula (I); and a compound represented by general formula (b1-1)
.[Chemical Formula 1]
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ X-Q 1 -Y 1 -SO - 3 M + €ƒ€ƒ€ƒ€ƒ€ƒ(1)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ X-Q 1 -Y 1 -SO - 3 A + €ƒ€ƒ€ƒ€ƒ€ƒ(b1 - 1)
wherein Q 1 represents a divalent linkage group or a single bond; Y 1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an -SO 2 - bond in the structure thereof; M + represents an alkali metal ion; and A + represents an organic cation.