发明名称 |
Manufacturing method of display device |
摘要 |
A manufacturing method of a display device, which prevents electrostatic breakdown of the display device both before and after a circuit test without reducing the productivity in forming a plurality of display devices on a substrate to be processed by a step-and-repeat exposing method. A wiring pattern group led out from signal input terminals of the display devices to the edge of the substrate to be processed is efficiently formed by exposing to light through a repetitive pattern integrated with a display device pattern. Depending on the states of the wiring pattern group as to contact or non-contact with a detachable and conductive component, the signal input terminals of the display devices can be easily switched between in a short circuited state and a non-short circuited state. Accordingly, both the measure against electrostatic breakdown and the circuit test are achieved in the display devices on the substrate to be processed.
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申请公布号 |
US7535535(B2) |
申请公布日期 |
2009.05.19 |
申请号 |
US20070723794 |
申请日期 |
2007.03.22 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
IWABUCHI TOMOYUKI |
分类号 |
G02F1/13;G02F1/1345;G02F1/1333;G02F1/1362;G09F9/00;G09F9/30;H01L21/027;H01L29/786 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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