发明名称 Methods including fluxless chip attach processes
摘要 Electronic devices and methods for fabricating electronic devices are described. One method includes providing a plurality of first metal bumps on a first surface, and a plurality of second metal bumps on a second surface, wherein at least one of (i) the plurality of first metal bumps, and (ii) the plurality of second metal bumps, comprises a solder. The method also includes forming a metal region including indium and tin, on at least one of (i) the plurality of first metal bumps, and (ii) the plurality of second metal bumps. The method also includes positioning the first metal bumps on the second metal bumps, and heating the metal bumps and the metal region and melting the solder. Other embodiments are described and claimed.
申请公布号 US7534715(B2) 申请公布日期 2009.05.19
申请号 US20050323526 申请日期 2005.12.29
申请人 INTEL CORPORATION 发明人 JADHAV SUSHEEL;LU DAOQIANG;DESHPANDE NITIN
分类号 H01L21/44;H01L21/48 主分类号 H01L21/44
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