发明名称 |
Mask for forming fine pattern and method of forming the same |
摘要 |
In a mask for forming a fine pattern to completely transfer a first and a second pattern from the mask onto a receiving object, and a method of forming the mask, the mask includes a first pattern, a second pattern, and a supplemental pattern. The first pattern repeats in a first direction. The second pattern is arranged between and parallel to the first pattern and has a first width W1. The supplemental pattern is disposed between the first pattern and the second pattern, and is spaced apart by a first distance D1 in the first direction from the second pattern.
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申请公布号 |
US7536671(B2) |
申请公布日期 |
2009.05.19 |
申请号 |
US20060590352 |
申请日期 |
2006.10.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIN JAE-PIL;KIM YOUNG-ILE;YOO MOON-HYUN |
分类号 |
G06F17/50;G03F1/36;G03F1/68;G06F19/00;G21K5/00;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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