发明名称 Conductor structures including penetrable materials
摘要 Conductor structures include a substrate, a first conducting layer that is selectively passivated from growth of unwanted surface layers by the application of a selective passivation layer, and a second conducting layer that is applied onto the selective passivation layer. The selective passivation layer prevents the combination of unwanted materials with the first conducting layer while allowing the combination of the applied second conducting layer with the first conducting layer. The selective passivation layer is displaced by the second conducting layer and remains as a passivation layer on the exposed surface of the second conducting layer being displaced, thereby protecting the first and second conducting layers from unwanted materials or unwanted surface layers. Methods of fabricating conductor structures are also provided.
申请公布号 US7534967(B2) 申请公布日期 2009.05.19
申请号 US20040785615 申请日期 2004.02.25
申请人 UNIVERSITY OF NORTH TEXAS 发明人 KELBER JEFFRY A.;LEI JIPU;MAGTOTO NOEL P.;RUDENJA SERGEI
分类号 H01R12/04;H01L21/285;H05K1/11 主分类号 H01R12/04
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