发明名称 Integrated circuit devices including compliant material under bond pads and methods of fabrication
摘要 An integrated circuit device includes a die having an interconnect structure formed over a surface thereof. A volume of compliant material located within the interconnect structure underlies one or more bond pads disposed on an uppermost layer of the interconnect structure. The compliant material may absorb stresses exerted on the interconnect structure during assembly, testing, or subsequent operation. Other embodiments are described and claimed.
申请公布号 US7535114(B2) 申请公布日期 2009.05.19
申请号 US20050301557 申请日期 2005.12.13
申请人 INTEL CORPORATION 发明人 AGRAHARAM SAIRAM;MANEPALLI RAHUL N.
分类号 H01L29/40 主分类号 H01L29/40
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