OPC simulation model using SOCS decomposition of edge fragments

摘要

A system for estimating image intensity within a window area of a wafer using a SOCS decomposition to determine the horizontal and vertical edge fragments that correspond to objects within the window area. Results of the decomposition are used to access lookup tables that store data related to the contribution of the edge fragment to the image intensity. Each lookup table stores data that are computed under a different illumination and feature fabrication or placement conditions.