发明名称 Silicon-containing compound, composition containing said compound, and insulating material
摘要 A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): <?in-line-formulae description="In-line Formulae" end="lead"?>AnSiX(4-n) (1)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.
申请公布号 US7534904(B2) 申请公布日期 2009.05.19
申请号 US20050138352 申请日期 2005.05.27
申请人 FUJIFILM CORPORATION 发明人 MORITA KENSUKE;YAGIHARA MORIO;WARIISHI KOJI
分类号 C07F7/18;C07F7/08;C08L83/04;C09D183/04 主分类号 C07F7/18
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