发明名称 Fabrication process for magneto-resistive effect devices of the CPP structure
摘要 A free layer functions such that a magnetization direction changes depending on an external magnetic field, and is made up of a multilayer structure including a first Heusler alloy layer, and a fixed magnetization layer takes a form wherein an inner pin layer and an outer pin layer are stacked one upon another with a nonmagnetic intermediated layer sandwiched between them. The inner pin layer is made up of a multilayer structure including a second Heusler alloy layer. The first and second Heusler alloy layers are each formed by a co-sputtering technique using a split target split into at least two sub-targets in such a way as to constitute a Heusler alloy layer composition. When the Heusler alloy layer is formed, therefore, it is possible to bring up a film-deposition rate, improve productivity, and improve the performance of the device.
申请公布号 US7533456(B2) 申请公布日期 2009.05.19
申请号 US20070757174 申请日期 2007.06.01
申请人 TDK CORPORATION 发明人 TSUCHIYA YOSHIHIRO;MIZUNO TOMOHITO;SHIMAZAWA KOJI
分类号 G11B5/127;H04R31/00 主分类号 G11B5/127
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