发明名称 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
摘要 <p>In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.</p>
申请公布号 KR20090049033(A) 申请公布日期 2009.05.15
申请号 KR20080112078 申请日期 2008.11.12
申请人 ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. 发明人 AMARA JOHN P.;PUGLIANO NICOLA;SUNG, JIN WUK;GALLAGHER MICHAEL K.;CASTORANO MICHAEL S.
分类号 G03F7/004 主分类号 G03F7/004
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