发明名称 OPTICAL SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To solve a problem wherein laser characteristics are degraded especially at a high temperature since element resistance is high in a DFB laser having an InGaAlAs active layer. SOLUTION: On an InGaAlAs-MQW layer 104 formed on an n-type InP substrate 101, a p-type InGaAlAs-GRIN-SCH layer 105, a p-type InAlAs electron stop layer 106, and a p-type diffraction grating layer 107 are layered in this order. After forming a diffraction grating, a p-type InP clad layer 108 and a p-type InGaAs contact layer are regrown sequentially, to fabricate a ridge laser. The depth of the unevenness of the diffraction grating in the p-type diffraction grating layer 107 is smaller than the thickness of the layer 107. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009105458(A) 申请公布日期 2009.05.14
申请号 JP20090029301 申请日期 2009.02.12
申请人 HITACHI LTD;OPNEXT JAPAN INC 发明人 NAKAHARA KOJI;TSUCHIYA TOMONOBU;OYA AKIRA;SHINODA KAZUNORI
分类号 H01S5/12;H01S5/22;H01S5/343 主分类号 H01S5/12
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