发明名称 |
Material processing system and method |
摘要 |
A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.
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申请公布号 |
US2009121132(A1) |
申请公布日期 |
2009.05.14 |
申请号 |
US20080232972 |
申请日期 |
2008.09.26 |
申请人 |
CARL ZEISS NTS GMBH;NAWOTEC GMBH |
发明人 |
KOOPS HANS W.P.;HOFFROGGE PETER |
分类号 |
G01N23/00;C23C16/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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