| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film patterning apparatus which is capable of performing a patterning process without using a photolithography process and permits simplification of fabricating processes and to provide a method of fabricating color filter array substrate using the thin film patterning apparatus, with respect to the method of fabricating a color filter array substrate provided with an overcoat layer particularly having a flat surface. <P>SOLUTION: The method of fabricating color filter array substrate comprises: a process of forming a black matrix on a substrate; a process of forming a color filter of red, green and blue; a process of forming the overcoat layer including a white color filter on the substrate on which the color filter of red, green and blue is formed; a process of aligning flat plate soft molds to the overcoat layer; and a process of smoothing the overcoat layer by using the flat plate soft molds. <P>COPYRIGHT: (C)2009,JPO&INPIT |
