MASK PATTERN DIMENSIONAL INSPECTION APPARATUS AND METHOD

摘要

A sidewall shape correction function is determined in advance which represents the relationship of the difference between contour positions of two or more items of pattern contour position data of different thresholds obtained from an SEM image and optical pattern contour positions determined through an optical method. Two or more items of pattern contour position data of different thresholds are obtained from SEM image data on which a lithographic simulation is to be conducted. Pseudo-optical pattern contour position data are determined from the contour position difference and the sidewall shape correction function. A lithographic simulation is conducted using the pseudo-optical pattern contour position data.