PLASMA PROCESSING APPARATUS AND METHOD FOR TRANSFERRING PROCESSING MATERIAL
摘要
<p>Provided is a plasma processing apparatus by which floating accuracy of processing material is stabilized and desired plasma processing is performed to the processing material. A guide plate (7) has 112 circular gas jetting ports (8) in total in 16 rows arranged in a direction parallel to a transfer direction. Each row has seven circular gas jetting ports in a direction orthogonally intersecting with the transfer direction. The 112 gas jetting ports (8) are separated into eight independent strip-like jetting port groups (9) by every two rows of 14 jetting ports. A control functional section controls a floating gas to be sequentially jetted from the gas jetting ports (8) of the jetting port group (9) relating to floating of the processing material (5, 6) in a processing material carry-in chamber (1), a plasma processing chamber (2) and a processing material carry-out chamber (3). The control functional section also controls to sequentially stop jetting of the floating gas from the gas jetting ports (8) of the jetting hole group (9) which stopped to relate to floating of the processing material (5, 6).</p>
