发明名称 PHOTOVOLTAICS WITH INTERFEROMETRIC MASKS
摘要 <p>An interferometric mask 300 covering the front electrodes 910, 91 1 of a photovoltaic device 900 is disclosed. Such an interferometric mask 300 may reduce reflections of incident light from the electrodes 910, 911. In various embodiments, the mask reduces reflections so that a front electrode 910, 911 pattern appears similar in color to adjacent regions of visible photovoltaic active material.</p>
申请公布号 CA2703702(A1) 申请公布日期 2009.05.14
申请号 CA20082703702 申请日期 2008.10.27
申请人 QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 KOTHARI, MANISH;KHAZENI, KASRA
分类号 H01L31/0216;G02B5/28;G02B26/00 主分类号 H01L31/0216
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