| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for giving contamination-resistance excellent in hardness and scratch resistance, and to provide a cured material and goods using the composition. <P>SOLUTION: The composition comprises a polymer (A) and a photo induced radical polymerization initiator (B), wherein, the polymer (A) has a structure formed by the reaction of a carboxylic acid having a (meth)acryloyl group with at least one part of an epoxy group of a radical polymer of a monomer mixture of 100 pts.wt. in total including (a1) a 0.01-15 pts.wt. α,ω-dimercapto-polysiloxane, (a2) a 5-60 pts.wt. (meth)acrylate having an epoxy group, (a3) a 0-5 pts.wt. monofunctional mercaptane having a molecular weight of 100-300, (a4) a 20-60 pts.wt. (meth)acrylate having a perfluoro alkyl group, and (a5) another (meth)acrylate of 1-50 pts.wt. <P>COPYRIGHT: (C)2009,JPO&INPIT |
