发明名称 METHOD OF MANUFACTURING VERTICAL PHASE CHANGE MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a variable resistive memory element for forming a smaller bottom electrode since it is required to reduce a contact area of the bottom electrode with a variable resistive material so as to reduce power consumption in a variable resistive memory device. SOLUTION: A smaller bottom electrode can be formed by combining anisotropic etching treatment and isotropic etching treatment. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009105082(A) 申请公布日期 2009.05.14
申请号 JP20070272712 申请日期 2007.10.19
申请人 ELPIDA MEMORY INC 发明人 SEKO AKIYOSHI;SATO NATSUKI;ASANO ISAMU
分类号 H01L27/105;H01L27/10;H01L45/00 主分类号 H01L27/105
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