发明名称 |
METHOD OF MANUFACTURING VERTICAL PHASE CHANGE MEMORY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a variable resistive memory element for forming a smaller bottom electrode since it is required to reduce a contact area of the bottom electrode with a variable resistive material so as to reduce power consumption in a variable resistive memory device. SOLUTION: A smaller bottom electrode can be formed by combining anisotropic etching treatment and isotropic etching treatment. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009105082(A) |
申请公布日期 |
2009.05.14 |
申请号 |
JP20070272712 |
申请日期 |
2007.10.19 |
申请人 |
ELPIDA MEMORY INC |
发明人 |
SEKO AKIYOSHI;SATO NATSUKI;ASANO ISAMU |
分类号 |
H01L27/105;H01L27/10;H01L45/00 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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