发明名称 COMPOSITION AND DEVICE FOR GAS SORPTION AND THEIR MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a composition with a small thickness to be placed in a gas sorbing device, for sorption of both a residual gas in an evacuated chamber and impurities in an inert gas, which can be stored and transported without being kept under an inert atmosphere after production of a mixture. <P>SOLUTION: The device is provided with a composition for gas sorption comprising a gas sorbing component A dispersed in a cross-linked porous matrix. The composition is produced by a process comprising: a step of mixing and dispersing at least one precursor into a matrix containing a polysiloxane resin, wherein the precursor can be converted into the gas sorbing component A through the following heat treatment, and the polysiloxane resin is resistant in a continuous treatment at a temperature up to 650°C when filled with an inorganic material; and a step of subjecting the thus obtained mixture to a heat treatment under vacuum or an atmosphere of a gas inert to the component A under a condition such that the precursor is converted into the gas sorbing component A and the cross-linked structure of the polysiloxane resin is retained. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009101364(A) 申请公布日期 2009.05.14
申请号 JP20090030355 申请日期 2009.02.12
申请人 SAES GETTERS SPA 发明人 CATTANEO LORENA;GALLITOGNOTTA ALESSANDRO
分类号 B01J20/28;B01D53/04;B01D53/26;B01D53/28;B01J20/26;C08J3/20;C08K3/00;C08L83/04;G01N;G01N1/00;H01L51/50;H05B33/04;H05B33/10 主分类号 B01J20/28
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