发明名称 |
METHOD FOR FORMING AN OPENING OF NANO-METER SCALE |
摘要 |
A method for forming an opening of nano-meter scale includes providing a substrate with a material layer, and later forming a first part of the opening and then forming a second part of the opening in the material layer. At least one of the first part and the second part of the opening is formed by imprint.
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申请公布号 |
US2009123877(A1) |
申请公布日期 |
2009.05.14 |
申请号 |
US20070940305 |
申请日期 |
2007.11.14 |
申请人 |
SHIH HUI-SHEN;CHIEN YU-FANG |
发明人 |
SHIH HUI-SHEN;CHIEN YU-FANG |
分类号 |
B28B11/08;G03F7/00 |
主分类号 |
B28B11/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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