发明名称 METHOD FOR FORMING AN OPENING OF NANO-METER SCALE
摘要 A method for forming an opening of nano-meter scale includes providing a substrate with a material layer, and later forming a first part of the opening and then forming a second part of the opening in the material layer. At least one of the first part and the second part of the opening is formed by imprint.
申请公布号 US2009123877(A1) 申请公布日期 2009.05.14
申请号 US20070940305 申请日期 2007.11.14
申请人 SHIH HUI-SHEN;CHIEN YU-FANG 发明人 SHIH HUI-SHEN;CHIEN YU-FANG
分类号 B28B11/08;G03F7/00 主分类号 B28B11/08
代理机构 代理人
主权项
地址